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DCHAS-L Discussion List Archive



Date: Sat, 4 Jun 2011 14:53:47 -0400
Reply-To: DCHAS-L Discussion List <DCHAS-L**At_Symbol_Here**LIST.UVM.EDU>
Sender: DCHAS-L Discussion List <DCHAS-L**At_Symbol_Here**LIST.UVM.EDU>
From: Craig Conway <conway.csa**At_Symbol_Here**GMAIL.COM>
Subject: Re: Chemical Dispersion Modeling
In-Reply-To: <1954258489-1307208880-cardhu_decombobulator_blackberry.rim.net-1399320992-**At_Symbol_Here**b17.c14.bise7.blackberry>

Thanks guys, I think a comparative study of these examples would be very interesting. Additionally, it was great to receive input from BakerRisk, and Pfizer. Regards, Craig M Conway *Technical Risk Analyst* * * On Sat, Jun 4, 2011 at 1:34 PM, wrote: > You can try EFFECTS of TNO, but I also prefer PHAST of DNV. > > Inigo Maranon - Seg. Industrial y Ciudadana - TESICNOR > ------------------------------ > *From: * Arnab Chakrabarty > *Sender: * DCHAS-L Discussion List > *Date: *Fri, 3 Jun 2011 13:43:01 -0500 > *To: * > *ReplyTo: * DCHAS-L Discussion List > *Subject: *Re: [DCHAS-L] Chemical Dispersion Modeling > > We use Unified Dispersion Model (UDM) as implemented in our in house > SafeSite3G=AE software. > > > > Thanks > > Arnab > > > > Arnab Chakrabarty, PhD > > Project 2 Consultant > > BakerRisk > > 2818223100 > > > > > > *From:* DCHAS-L Discussion List [mailto:DCHAS-L**At_Symbol_Here**list.uvm.edu] *On Behalf > Of *Craig Conway > *Sent:* Friday, June 03, 2011 12:20 PM > *To:* DCHAS-L**At_Symbol_Here**LIST.UVM.EDU > *Subject:* [DCHAS-L] Chemical Dispersion Modeling > > > > I'm interested in doing a survey of chemical plume/dispersion modeling > softwares, which I could then present at a future friday lunch presentati on > at my company. > > > > Specifically, I'm interested in acute atmospheric release, accounting for > topological and urban barriers, of industrial chemicals. > > > > Though, if all we can find are 2 dimensional open plane software examples , > it may still be interesting to compare. > > > > If anyone has any recommendations, please send them to me on or off list. > I'd appreciate any assistance, pointers, or general user feedback regardi ng > these software applications. > > > > Thanks, > > Craig > > > -- > Craig M Conway > > *Technical Risk Analyst* > > > > > > >

Thanks guys, I think a comparative study of these examples would be ve ry interesting.=A0

Additionally, it was great to r eceive input from BakerRisk, and Pfizer.=A0


Regards,
=A0
Craig M Conway
Technical Risk Analyst


On Sat, Jun 4, 2011 at 1:34 PM, <imaranon**At_Symbol_Here**tesicnor.com&g t; wrote:
You can try EFFECTS of T NO, but I also prefer PHAST of DNV.

Inigo Maranon - Seg. Industrial y Ciu dadana - TESICNOR


From: Arnab Chakrabarty << a href="mailto:achakrabarty**At_Symbol_Here**BAKERRISK.COM" target="_blank">achakrabarty **At_Symbol_Here**BAKERRISK.COM>
Sender: DCHAS-L Discussion List <DCHAS-L**At_Symbol_Here**list.uvm.edu>
Date: Fri, 3 Jun 2011 13:43:01 -0500
ReplyTo: DCH AS-L Discussion List <DCHAS-L**At_Symbol_Here**list.uvm.edu>
Subject: Re: [DCHAS-L] Chemical Dispersion Modeling

We use Unified Dispersion Model (UDM) as implemented in our in house SafeSite 3G=AE software.=A0

=A0

Thanks

Arnab

=A0

Arnab Chakrabarty, PhD

Project 2 Consultant

Ba kerRisk

2818223100

=A0

=A0

From: DCHAS-L Discussion List [mailto:DCHAS-L**At_Symbol_Here**list.uvm.edu ] On Behalf Of Craig Conway
Sent: Friday, June 03, 2011 12:20 PM
To: DCHAS-L**At_Symbol_Here**LIST.UVM.EDU
Sub ject: [DCHAS-L] Chemical Dispersion Modeling

=A0

I'm interested in doing a survey of chemical plume/dispersion modeling softwares, which I could then present at a future friday lunch presentation at my company. =A0

=A0

Specifically, I'm interested i n acute atmospheric release, accounting for topological and urban barriers, of industrial chemicals.=A0

=A0

Though, if all we can find are 2 dimensional open pl ane software examples, it may still be interesting to compare.=A0

=A0

If any one has any recommendations, please send them to me on or off list. I'd appreciate any assistance, pointers, or general user feedback regarding th ese software applications.=A0

=A0

Thanks,

Craig


--
Craig M Conway

< div>

Technical Risk Analyst

=A0

=A0








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